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Oil-Free Ultra-Moisturizing Lotion with Birch Sap
COSRX
Moisturizer
C
Clean
No flagged ingredients at typical use concentrations.
Sourced from official product listing.
Ingredients 22
Listed in order of concentration, highest first.
1
Betula Platyphylla Japonica Juice
Skin Conditioning
Purpose of formulation: skin conditioning agent
Clean
2
Butylene Glycol
Moisturizing
Purpose of formulation: solvent, humectant, skin conditioning agent
Clean
3
Glycerin
Moisturizing
Purpose of formulation: humectant, skin conditioning agent
Clean
4
Dimethicone
Texture
Purpose of formulation: skin conditioning agent, emollient (silicone)
Clean
5
Betaine
Moisturizing
Purpose of formulation: humectant, skin conditioning agent
Clean
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